Máy phân tích kim loại M2 Jinyibo

The M series optical emission spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector,  the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.

M2 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Al, Cu, Zn, Ti, Ni, Pb, etc ). In steel, raw iron, cast iron, non-ferrous metal production a fully or even partially automated analysis results in a cost reduction. This also gives the user a truly portable spectrometer that’s both easy to use and easy to space saved.

• Application

Rolling mills, foundries, workshops: Rapid analysis; test several 100s of samples daily

Alloy manufacturers: Any number of bases / matrices; highly stable and precise

Medium-sized industries: Extremely rugged and economical; low cost / analysis

Foundries which need a quick analysis near the furnace

Manufacturing Facilities

Warehouse material identification

Base: Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc

• Features

Extremely competitive price

Smaller, lightweight, exquisite, reliable instrument.

Energy saving, standby power 50VA,

Light chamber filled with argon in place of complex vacuum system, No vacuum pump

High resolution COMS detector can achieve full spectrum analysis.

Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.

Wavelength range 165nm~580mn, spectral lines can cover all important elements Compact, rugged and flexible to a variety of bases and matrices

The smaller designed optical chamber structure and the optimized design of argon purge system can ensure transmission rate of elemental lines in UV area.

Spectrometer temperature control ensuring high precision and stability

Programmable digitalized spark source, generating optimized discharge waveform for different bases.

Professional data capture, improved accuracy by reducing background interference

Global factory calibration with interference correction

• Parameter