Máy phân tích kim loại M4 Jinyibo

The M series optical emission spectrometer adopt international standard design and manufacturing process technology, full digital combines with internet technology, and using high resolution CMOS detector,  the precisely designed argon purge system to guarantee instruments with higher performance, lower cost and extremely competitive price.

M4 Spectrometer is most suitable instrument for the determination of various elements in different matrices (Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc ). It is an ideal solution to quick analysis near the furnace, metal material quality analysis and research laboratories.This also gives the user a truly portable spectrometer that’s both easy to use and easy to space saved.

• Application

Large Steel Plants Where needs are at around 100 PPM levels or elements like C, N, Cr, S, P etc.

Testing Laboratories: Commercial testing laboratories, Universities and colleges

Regulatory compliance Very low LODs to control Pb, Cd, As etc.

Foundries which need a quick analysis near the furnace

Manufacturing Facilities

Warehouse material identification

Base: Fe, Cu, Al, Ni, Co, Mg, Ti, Zn, Pb, Sn, Ag, etc

• Features

Precise reliable, fast, versatile and affordable

Compact designed desktop unit

Energy saving, standby power 50VA,

The light chamber filled with argon in place of vacuum system .

High resolution CMOS detector can achieve full spectrum analysis.

Full wavelength coverage, customized factory calibration, adding new element without further hardware configuration.

Wavelength range 165nm~580nm(extendable), spectral lines can cover all important elements.

Highly sensitive UV detection with the precisely argon purge system, it is accurate for N analysis to analyze.

Spectrometer temperature control ensuring high precision and stability

Programmable digitalized spark source, generating optimized discharge waveform for different bases.

Advanced excitation protection and diagnostic system ensuring operating safety

Argon purge control protecting entrance lens form contaminating, minimizing maintenance

Professional data capture, improved accuracy by reducing background interference

Global factory calibration with interference correction

Technology support and software update for free.

• Parameter